This one-day course provides an-in-depth examination of one of the key technological drivers of modern microelectronics: Photolithography. The presentation is sophisticated, technically current, and taught by a world-class practitioner of the art.


Course Description:

No other technology plays a more important role in the advancement of microelectronics than photolithography. It is a key technology driver, and an understanding of the breakthroughs in photolithography is central to an understanding of modern silicon processing.

The course begins with an overview of the fundamental principles of photolithography and then examines in detail the underlying technical forces that have caused photolithography to evolve to its current state.
At the 90 nm node and below, the features being printed are smaller than the illuminating wavelength. This requires the use of Resolution Enhancement Techniques (RET) such as Optical Proximity Correction (OPC), Off-Axis Illumination (OAI), Inverse Lithography Technology (ILT), Phase-shift masking and immersion lithography. Precisely what these technologies are, what they do and how they work are explained clearly, correctly and in detail. In addition, alternative lithographic technologies such as double patterning, and maskless, Imprint, and EUV lithography are explained and their relative merits and deficiencies discussed. Special attention is paid to the lithographic challenges of 45 nm node technology.

All of these technologies and more will be presented by a master of the subject, Dr. Moshe Preil. A dramatic and engaging public speaker, Dr. Preil has taught numerous courses on the subject of optical lithography, has published extensively in this field, and is widely regarded as a gifted and inspiring instructor.

• Introduction to Lithography
  
• Status of current production Lithography
  
• Exposure tools for Lithography
  
• Immersion Lithography
  
• High Index of refraction fluids
  
• Resolution Enhancement Technologies
  • OPC
  • PSM
  • ILT
    
• Photoresist: CA resist issues
  
• Lithography manufacturing Issues
  
• 45 nm Lithography challenges
  
• Imprint Lithograph
  
• Double patterning
  
• Maskless Lithography
  
• EUV Lithography
  

COST: $595/Student

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